Back-Gate Effect on Coulomb Blockade in Silicon-on-Insulator Trench Wires

• Nishiguchi Katsuhiko

  NTT Basic Research Laboratories, NTT Corporation

• Crauste Olivier

  ESPCI

• Namatsu Hideo

  NTT Basic Research Laboratories, NTT Corporation

• Horiguchi Seiji

  Faculty of Engineering and Resource Science, Akita University

• Ono Yukinori

  NTT Basic Research Laboratories, NTT Corporation

• Fujiwara Akira

  NTT Basic Research Laboratories, NTT Corporation

• Takahashi Yasuo

  Graduate School of Information Science and Technology, Hokkaido University

• Inokawa Hiroshi

  NTT Basic Research Laboratories, NTT Corporation

Abstract

A back-gate (BG) effect on a Coulomb blockade in a double-gate silicon-on-insulator (SOI) nanowire is investigated. The nanowire, which is situated at the bottom of a trench and connected to thicker source/drain regions, has a naturally formed barrier at both ends and works as a single-electron transistor at low temperatures. We found that a negative BG voltage increases the charging energy of the Coulomb-blockade island in the nanowire as well as the tunnel resistance of the barriers. This indicates the possibility that the BG voltage shifts the electron wave functions in the source/drain area away from the Coulomb-blockade island and decreases the capacitance of the small junctions located at both ends of the island.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 44 (10), 7717-7719, 2005

  The Japan Society of Applied Physics

Keywords

• single-electron devices
• silicon-on-insulator
• back-gate voltage

Details

• CRID: 1390282681243377152
• NII Article ID: 130004766081
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.44.7717
• ISSN: 13474065
• ISSN: 00214922
• ISSN: http://id.crossref.org/issn/13474065
• NDL BIB ID: 7479826
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7479826
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.7717
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.7717/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed