Innovation via Photosensitive Polyimide and Poly(benzoxazole) Precursors-a Review by Inventor

• Rubner Roland

  Department of Organic Chemistry, Friedrich-Alexander-University Erlangen-Nuremberg

抄録

In order to work out indispensable criteria for a promising process of innovation, a historical review is given for two paths of innovation, which the author was involved in as an chemist in electrical industry from the initial idea up to commercialization and application in the field of microelectronics and electronics. The examples concern the approach to thermally stable organic patterns via photosensitive precursors of polyimides (negative mode) and of poly(benzoxazoles) (positive mode). After direct photolithographic patterning the precursor layers can be thermally converted into polyimide and poly(benzoxazole), respectively. The photoresists have been commercialized by licensed chemical companies. They have been and still are mainly applied to memory and logic devices as protective and buffer coatings to reduce the stress caused by an encapsulating resin, and to thin film multichip modules as planarizing interlayer dielectrics.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 17 (5), 685-691, 2004

  フォトポリマー学会

キーワード

• photoresist
• polyimide
• poly(benzoxazole)
• precursor
• innovation

詳細情報

• CRID: 1390001204323811968
• NII論文ID: 130004832987
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.17.685
• COI: 1:CAS:528:DC%2BD2MXnslCgsw%3D%3D
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 7196941
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7196941
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer/17/5/17_5_685/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可