Environmentally Friendly Positive- and Negative-tone Photo-patterning Systems of Low-K and Low-CTE Polyimides

• Hasegawa Masatoshi

  Department of Chemistry, Faculty of Science, Toho University

• Tominaga Azumi

  Department of Chemistry, Faculty of Science, Toho University

Abstract

A low-K and low-CTE polyimide, CBDA/TFMB (CBDA = 1,2,3,4-cyclobutanetetracarboxylic dianhydride, TFMB = 2,2'-bis(trifluoromethyl)benzidine) was applied to photosensitive materials. Poly(amic acid) (PAA) of this system was modified using imide-containing diamines to control the solubility in alkaline solutions. Copolymerization using them made possible to form positive-tone fine pattern in combination with diazonaphthoquinone. Additionally it was found that this PAA film is quite soluble in some environmentally friendly (biodegradable) solvents, e.g., alcohols, glycols, and their monoalkyl ethers. PAA film containing an ionic bonding-type methacrylate and a photoinitiator gave fine negative patterns. The corresponding PI films cured from these photosensitive PAA films exhibited a low CTE, a low K, a high Tg, and high transparency comparable to the original PI film.

Journal

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 18 (2), 307-312, 2005

  The Society of Photopolymer Science and Technology(SPST)

Keywords

• low-K and low-CTE polyimides
• environmentally friendly negative- and positive-type photo-patterning

Details

• CRID: 1390282679302993152
• NII Article ID: 130004833026
• NII Article ID: 40006743900
• NII Book ID: AA11576862
• DOI: 10.2494/photopolymer.18.307
• COI: 1:CAS:528:DC%2BD2MXmtV2qu7g%3D
• ISSN: 13496336
• ISSN: 09149244
• NDL BIB ID: 7338554
• Web Site: http://id.ndl.go.jp/bib/7338554
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7338554
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer/18/2/18_2_307/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed