Preparation and Characterization of Polyimide/Fluorinated Silicate Nano-hybrid Thin Films with Low Refractive Indices

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Author(s)

    • Han Yulai Han Yulai
    • Department of Chemistry & Materials Science, Tokyo Institute of Technology|Institute of Polymer Science & Engineering,Department of Chemical Engineering, Tsinghua University
    • Wang Xiaogong
    • Institute of Polymer Science & Engineering,Department of Chemical Engineering, Tsinghua University
    • Ando Shinji
    • Department of Chemistry & Materials Science, Tokyo Institute of Technology

Abstract

A new series of polyimide (PI)-fluorinated silicate nano-hybrid materials with low refractive indices were prepared by the sol-gel process based on the PI derived from 4,4' (hexafluoroisopropylidene) diphthalic anhydride (6FDA) and 4,4'diaminodicyclohexyl- methane (DCHM). Triethoxy-1H,1H,2H,2H-tridecafluoro-n-octylsilane (13FTES) and tetraethoxysilane (TEOS) were employed to prepare the silicate precursors. Furthermore, 2-aminopropyl triethoxysilane (APrTEOS) was used as a coupling agent to improve the compatibility between the polymeric and inorganic domains of the nano-hybrid materials. The chemical structures of organo-silicate and hybrid materials were examined with solid state <sup>29</sup>Si- and <sup>19</sup>F-NMR and IR spectra. The thermal stability of PIs was not deteriolated with increasing the amount of TEOS, whereas it was sacrificed with the increase of 13FTES. The refractive indices of the hybrids can be controlled through the silica content, and low refractive indices were obtained for the prepared hybrid films. The PI/silicate nano-hybrid materials thus obtained are promising for high performance optical devices.

Journal

  • Journal of Photopolymer Science and Technology

    Journal of Photopolymer Science and Technology 21(1), 143-150, 2008

    The Society of Photopolymer Science and Technology

Codes

  • NII Article ID (NAID)
    130004833224
  • NII NACSIS-CAT ID (NCID)
    AA11576862
  • Text Lang
    ENG
  • Article Type
    journal article
  • ISSN
    0914-9244
  • NDL Article ID
    9549215
  • NDL Source Classification
    ZP48(科学技術--印写工学)
  • NDL Call No.
    Z53-W515
  • Data Source
    NDL  IR  J-STAGE 
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