Fabrication of Micro Tube Array by Combining Positive with Negative Type Photoresists due to Solubility Difference in Developer

• Otsuka Kazutoshi

  Department of Electrical Engineering, Nagaoka University of Technology

• Takahashi Kenta

  Nissan Chemical Industries, LTD.

• Kawai Akira

  Department of Electrical Engineering, Nagaoka University of Technology

Abstract

The micro tube array in triple layer structure is constructed due to solubility difference phenomena. The triple layers are fabricated by photolithography process with i-line and SU-8 photoresists. The first and third layers are formed with SU-8 photoresist process. The second layer is formed by i-line photoresist process. Both i-line photoresist and unexposed SU-8 photoresist can be dissolved by dipping in the SU-8 developer at the same time. The exposed region of the SU-8 photoresist film is remained. The SU-8 photoresist film is formed in micro tube array structure. The shape of micro tube array is fabricated in rectangle of 10.0mm length and 3.05mm width. The array hole is formed 103μm width and 8.96μm thickness. By applying this process, unique structures of microfluidic system such as artificial capillary blood tube can be realized.

Journal

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 26 (6), 717-720, 2013

  The Society of Photopolymer Science and Technology(SPST)

Keywords

• photoresist
• solubility difference
• capillary tube
• micro tube
• array structure
• SU-8 photoresist

Details

• CRID: 1390001204325069184
• NII Article ID: 130004833543
• NII Article ID: 40019925757
• NII Book ID: AA11576862
• DOI: 10.2494/photopolymer.26.717
• ISSN: 13496336
• ISSN: 09149244
• NDL BIB ID: 025112201
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025112201
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/26/6/26_717/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed