Effect of Low Surface Tension Developer on Micro Bubble Removal from Resist Square Window Pattern

• Takahashi Kenta

  Nissan Chemical Industries, LTD.

• Kawai Akira

  Department of Electrical Engineering, Nagaoka University of Technology

Abstract

In pattern developmemt, a removal property of bubbles formed on a concave window pattern made of DFR (dry film resist) is characterized. The sizes of the DFR window pattern are 100μm square and 50μm height. The fundamental factors of removal property can be explained by means of interaction analysis among interfacial energies. The experimental results obtained are analyzed based on the free energy balance model thermodynamically. The factor of micro bubble removal from the DFR window pattern is discussed for the suitable micro pattern fabrication. By adding a hydrophobic nonionic surfactant, both polar and dispersion components of surface energy of the developer clearly decrease. These components change act to decrease surface tension of the developer. The effectiveness of low surface tension developer on the removal property of micro bubble can be explained based on surface energy.

Journal

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 26 (6), 765-768, 2013

  The Society of Photopolymer Science and Technology(SPST)

Keywords

• DFR
• micro bubble
• surface energy
• window pattern
• surfactant
• TMAH developer

Details

• CRID: 1390282679301503872
• NII Article ID: 130004833551
• NII Article ID: 40019925924
• NII Book ID: AA11576862
• DOI: 10.2494/photopolymer.26.765
• ISSN: 13496336
• ISSN: 09149244
• NDL BIB ID: 025112487
• Web Site: http://id.ndl.go.jp/bib/025112487
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025112487
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/26/6/26_765/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed