Effect of step edges on the growth of Pt thin films on oxide single-crystal substrates

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Author(s)

    • ITO Hiroki ITO Hiroki
    • Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology
    • CROSS Jeffrey
    • Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology
    • SAKURAI Osamu
    • Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology
    • SHINOZAKI Kazuo
    • Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology

Abstract

To study the effect of step edges on the growth of Pt thin films on oxide substrates, Pt films were grown on SrTiO<sub>3</sub>(100), rutile TiO<sub>2</sub>(100), and Al<sub>2</sub>O<sub>3</sub>(11–20) stepped surfaces at 673 and 973 K by pulsed laser deposition. No clear effect due to the step edges on the film growth was found on the SrTiO<sub>3</sub> at 673 K. However, the Pt grains were larger in size at the step edges than on the terraces at 973 K. The estimated length of the Pt surface diffusion was longer than the average terrace width at 973 K and shorter at 673 K. Similar growth behavior was also observed on the TiO<sub>2</sub> at 973 K, while there was no clear effect caused by the step edges in the case of the Al<sub>2</sub>O<sub>3</sub>. The Pt diffusion length was estimated to be longer than the terrace width on the TiO<sub>2</sub> and shorter on the Al<sub>2</sub>O<sub>3</sub>. The effect of the step edges can therefore be understood by considering the Pt surface diffusion.

Journal

  • Journal of the Ceramic Society of Japan

    Journal of the Ceramic Society of Japan 121(1411), 278-282, 2013

    The Ceramic Society of Japan

Codes

  • NII Article ID (NAID)
    130004950829
  • NII NACSIS-CAT ID (NCID)
    AA12229489
  • Text Lang
    ENG
  • ISSN
    1882-0743
  • NDL Article ID
    024291041
  • NDL Call No.
    Z78-A504
  • Data Source
    NDL  J-STAGE 
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