Effects of Atomic Weight, Gas Pressure, and Target-to-substrate Distance on Deposition Rates in the Sputter Deposition Process

• NAKANO Takeo

  Department of Materials and Life Science, Seikei University

• YAMAZAKI Ryo

  Department of Materials and Life Science, Seikei University

• BABA Shigeru

  Department of Materials and Life Science, Seikei University

抄録

  The transport process of sputtered atoms has been studied experimentally through deposition rate measurement by changing the target-to-substrate (T-S) distance systematically along with the gas pressure and target element. The deposition rate showed power-law decay with the T-S distance, and the slope of the log-log plot became steep at a transition pressure. The transition pressure decreased as the mass of the sputtered atoms decreased, which suggested that the transition was related to the transport of the sputtered atoms and their thermalization. Two separated thickness monitors showed that the thickness uniformity was worsened by the thermalization.<br>

収録刊行物

• Ｊｏｕｒｎａｌ　ｏｆ　ｔｈｅ　Ｖａｃｕｕｍ　Ｓｏｃｉｅｔｙ　ｏｆ　Ｊａｐａｎ

  Ｊｏｕｒｎａｌ　ｏｆ　ｔｈｅ　Ｖａｃｕｕｍ　Ｓｏｃｉｅｔｙ　ｏｆ　Ｊａｐａｎ 57 (4), 152-154, 2014

  一般社団法人 日本真空学会

キーワード

• Spectroscopy
• Surfaces and Interfaces
• Instrumentation
• General Materials Science

詳細情報

• CRID: 1390282680270363008
• NII論文ID: 130004952507
• NII書誌ID: AA12298652
• DOI: 10.3131/jvsj2.57.152
• ISSN: 18824749
• ISSN: 18822398
• NDL書誌ID: 025460235
• Web Site: http://id.ndl.go.jp/bib/025460235
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025460235
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• 抄録ライセンスフラグ: 使用不可