Fabrication of Zinc Oxide Nanostructures by Mist Chemical Vapor Deposition
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- Li Xin
- Institute for Nanotechnology, Kochi University of Technology Electronic and Photonic Systems Engineering Department, Kochi University of Technology
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- Li Chaoyang
- Institute for Nanotechnology, Kochi University of Technology
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- Kawaharamura Toshiyuki
- Institute for Nanotechnology, Kochi University of Technology
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- Wang Dapeng
- Institute for Nanotechnology, Kochi University of Technology
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- Nitta Noriko
- Institute for Nanotechnology, Kochi University of Technology
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- Furuta Mamoru
- Environmental Engineering Department, Kochi University of Technology
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- Furuta Hiroshi
- Electronic and Photonic Systems Engineering Department, Kochi University of Technology
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- Hatta Akimitsu
- Institute for Nanotechnology, Kochi University of Technology Electronic and Photonic Systems Engineering Department, Kochi University of Technology
抄録
ZnO nanostructures with well-controlled growth on silicon substrate were fabricated in a reducing gas ambient following by a novel mist chemical vapor deposition (Mist CVD) treatment. The effects of Mist CVD post-treatment time on the crystal growth, structural properties were investigated. It was found that the morphology of ZnO nanostructures was significantly modified and regrown during Mist CVD post-treatment process. The crystallinity of ZnO nanostructures was remarkably changed after Mist CVD post-treatment due to the huge regrowth of nanostructures. The mechanism of the nanostructures growth in Mist CVD was investigated in detail.
収録刊行物
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- Transactions of the Materials Research Society of Japan
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Transactions of the Materials Research Society of Japan 39 (2), 161-164, 2014
一般社団法人 日本MRS
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詳細情報 詳細情報について
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- CRID
- 1390001205511955712
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- NII論文ID
- 130005004316
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- ISSN
- 21881650
- 13823469
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可