Fabrication of transparent conductive zinc oxide films by chemical bath deposition using solutions containing Zn<sup>2+</sup> and Al<sup>3+</sup> ions  [in Japanese]

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Transparent ZnO films were fabricated on glass substrates by a chemical bath deposition method using zinc acetate solutions also containing AlCl<sub>3</sub>. A predominant effect of the Al<sup>3+</sup> addition seemed to be suppression of the growth of ZnO crystals and change of the crystallographic orientation of ZnO films. The <i>c</i>-axis and the <i>a</i>-axis of the ZnO films came to stand parallel and vertical to the substrate, respectively, by increasing the Al<sup>3+</sup> concentration. A post ultraviolet irradiation to the films led to a decrease in the sheet resistance from the order of 10<sup>6</sup> to 10<sup>4</sup> Ω·sq.<sup>−1</sup> without changing the morphology or the crystallinity. This might be related to the photocatalytic effect of ZnO to decompose residual organics in the films and increase the number of carriers. The ZnO film obtained from the solution with 1.0 mol % AlCl<sub>3</sub> showed the lowest sheet resistance of 2.5 × 10<sup>4</sup> Ω·sq.<sup>−1</sup>.


  • Journal of the Ceramic Society of Japan

    Journal of the Ceramic Society of Japan 123(1437), 329-334, 2015

    The Ceramic Society of Japan


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