Development of Environmental Harmony Resist Removal System using Cryogenic Particulate Spray

• Ishimoto Jun

  Institute of Fluid Science, Tohoku University

• Horibe Hideo

  Applied Chemistry and Bioengineering, Osaka City University

Abstract

It is numerically found that the atomization of LN₂ droplet is induced by shear flow between LN₂ and gaseous nitrogen (GN₂) flow. Sequentially, liquid to solid phase change is enhanced and solid nitrogen (SN₂) particle is continuously created by LN₂ droplet freezing. By using ToF-SIMS and XPS analysis for resist removal experiment, the obtained C film thickness of resist removal section is 0.2 nm. Therefore, the photo resist can be successfully removed by using cryogenic solid particulate spray method.

Journal

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 28 (2), 285-288, 2015

  The Society of Photopolymer Science and Technology(SPST)

Keywords

• cryogenics
• solid nitrogen
• spray
• atomization
• multiphase flow

Details

• CRID: 1390282679303009408
• NII Article ID: 130005093859
• NII Article ID: 40020519514
• NII Book ID: AA11576862
• DOI: 10.2494/photopolymer.28.285
• ISSN: 13496336
• ISSN: 09149244
• NDL BIB ID: 026578819
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I026578819
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/28/2/28_285/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed