高軒高温室における長期の加湿処理による飽差環境の違いがパプリカの葉の形態・光合成機能および収穫物に及ぼす影響  [in Japanese] Effects of Long-term Lower Vapor Pressure Deficit Condition by Fogging on Leaf Morphology, Photosynthetic Functions and Yield of Sweet Pepper (<i>Capsicum annuum</i> L.) Grown in Venlo Type Greenhouse  [in Japanese]

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Abstract

本研究では、長期的な昼間の加湿処理がパプリカの葉の形態と光合成機能に及ぼす影響について調査し、VPD環境の違いが葉の形態を変化させるだけでなく、光合成機能にも影響する可能性があることが示唆された。また、これらの結果は、適切な湿度環境制御によってパプリカの生産性向上が可能であることを示唆していた。ただし、本研究では、収穫量の増大や品質の向上といった生産性向上に直結する湿度環境制御の指針は得られていない。これについては、今後も引き続き研究を進める必要がある。なお、植物の長期的な環境応答には、短期的な環境応答の蓄積や季節による違いが想定されるため、植物生体情報を継続して数値評価する技術の活用が必要不可欠であると考えられる

The effects of low long-term vapor pressure deficit (VPD) conditions on leaf morphology, photosynthetic functions, and yield of sweet pepper (<i>Capsicum annuum</i> L.) grown in a Venlo-type greenhouse were investigated. The relative humidity in a greenhouse with a fogging system (Fog) was maintained at >70%, which was approximately 10% higher than that in a greenhouse without a fogging system (Control). In Fog, VPD was approximately 0.7 kPa during daytime throughout the experimental period (September 20, 2013 to January 31, 2014). In the low VPD condition, the water uptake decreased by 18% and the leaf area increased by 6% (upper leaf) to 20% (lower leaf). The maximum photosynthetic rate, total chlorophyll (Chl) content, and Chl <i>a</i>/<i>b</i> ratio of the lower leaves in Fog decreased compared with those in Control. These results suggested that the low water uptake in Fog because of the lower VPD probably decreased the nutrient uptake and resulted in the low total Chl content of the leaves. In addition, the lower VPD in Fog may have allowed leaf expansion and resulted in a higher leaf area index and acclimation of the lower leaves to the low light condition. However, there was no obvious difference in the yields between Fog and Control.

Journal

  • Eco-Engineering

    Eco-Engineering 27(3), 91-98, 2015

    The Society of Eco-Engineering

Codes

  • NII Article ID (NAID)
    130005095348
  • NII NACSIS-CAT ID (NCID)
    AA12005685
  • Text Lang
    JPN
  • ISSN
    1347-0485
  • NDL Article ID
    026641562
  • NDL Call No.
    Z15-644
  • Data Source
    NDL  J-STAGE 
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