Direct Fabrication of Metal Patterns on Resin Substrate by Combining Imprint and Electrochemical Lithography

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  • KIMURA Yusuke
    Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology(FIRST), Konan University
  • FUZIWARA Ryosuke
    Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology(FIRST), Konan University
  • TSURUOKA Takaaki
    Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology(FIRST), Konan University
  • TAKASHIMA Yohei
    Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology(FIRST), Konan University
  • NAWAFUNE Hidemi
    Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology(FIRST), Konan University
  • YANAGIMOTO Hiroshi
    Magnetic Material & Surface Modification Department, Metallic & Inorganic Material Engineering Division, Toyota Motor Corporation
  • AKAMATSU Kensuke
    Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology(FIRST), Konan University

Abstract

We report a new patterning method to fabricate metal patterns on polyimide substrate with trench structure by combining imprint and electrochemical lithography. Using an ion-doped precursor polyimide films with trench structure prepared by imprint lithography, metal thin films can be successfully deposited at convex portion of trench structure through electrochemical and ion-exchange reactions, which resulted in the generation of metal patterns on polyimide films. The present process is quite simple, which can be performed without resist coating, exposure and etching. Therefore, the study provides effective methodology for fabrication of flexible printed circuit boards.

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