Microscopic Observation of Degradation of LaNiO<sub>3 </sub>Ultrathin Films Caused by Air Exposure

  • Wakabayashi Yusuke
    Division of Materials Physics, Graduate School of Engineering Science, Osaka University
  • Maeda Hiroki
    Division of Materials Physics, Graduate School of Engineering Science, Osaka University
  • Kimura Tsuyoshi
    Division of Materials Physics, Graduate School of Engineering Science, Osaka University
  • Sakata Osami
    Synchrotron X-ray Station at SPring-8, National Institute for Materials Science (NIMS)
  • Sakai Enju
    High energy accelerator research organization
  • Kumigashira Hiroshi
    High energy accelerator research organization

Abstract

Sample degradation of LaNiO3 ultrathin films on SrTiO3 (001) substrate caused by air exposure is examined by means of crystal truncation rod (CTR) scattering method. Although the film is conductive right after the sample deposition, long term storage makes it insulating. CTR measurements were performed on three- and four-unit cell-thick samples just after the sample deposition and after six months of storage in air. The results show that the storage induced a signicant increase in the lattice spacing along the surface normal direction with keeping in-plane periodicity. Such a structural change can be caused by escaping oxygen atoms by the thermal uctuation. [DOI: 10.1380/ejssnt.2016.14]

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