回転 CVD 法によるニッケル触媒の開発

• 後藤 孝

書誌事項

タイトル別名

• Development of Nickel Catalyst by Rotary Chemical Vapor Deposition
• カイテン CVDホウ ニ ヨル ニッケル ショクバイ ノ カイハツ

抄録

Chemical vapor deposition （CVD） is generally employed to prepare thin films, whereas CVD can also prepare nano-particles by homogeneous nucleation in a gas phase or on support powder as catalyst. Although fluidized-bed CVD （FBCVD） has often been used to prepare particle/film on fluidized powder, the powder size of FBCVD is rather limited to several 10 to 100μm in diameter to fluidize powder in a gas phase. We have developed Rotary CVD （RCVD）, which has no limitation of powder size to deposit. Ni nano-particles a few nanometer in diameter were prepared on Al₂O₃, mesoporous silica and Zeorite powders by RCVD using Nickelocene precursor. Ni nano-particles were deposited inside mesoporous silica showing more than 6 times higher H₂ production by steam methane reforming reaction than that of conventional Ni catalyst.

収録刊行物

• 粉体工学会誌

  粉体工学会誌 53 (2), 90-97, 2016

  一般社団法人 粉体工学会

キーワード

• Rotary chemical vapor deposition
• Ni nano-particle
• Nickelocene
• Mesoporous silica
• Steam methane reforming reaction

詳細情報

• CRID: 1390001204511597184
• NII論文ID: 130005126510
• NII書誌ID: AN00222757
• DOI: 10.4164/sptj.53.90
• ISSN: 18837239
• ISSN: 03866157
• NDL書誌ID: 027103966
• Web Site: http://id.ndl.go.jp/bib/027103966
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I027103966
• Web Site: https://www.jstage.jst.go.jp/article/sptj/53/2/53_90/_pdf
• 本文言語コード: en
• データソース種別:
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