書誌事項
- タイトル別名
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- Si Nano-tip Sharpening and Fabrication of Narrow-gapped Dual AFM Probe
- Si ナノタンシン ノ センエイカ ト キンセツ デュアル AFM プローブ ノ ケイセイ
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This paper reports on fabrication and characterization of sharp Si nano dual AFM (atomic force microscope) tip. The narrow-gapped dual AFM tip was formed by self-align etching technique based on Si trench reactive ion etching, trench refilling with spin on glass (SOG), SOG etching and polishing back, and Si crystalline anisotropic etching to form triangular pyramid with inclined Si (111) plane and two vertical planes. When corner angle of the Si trench pattern was changed from 90° to acute angles, needle end of the dual tip was geometrically sharpened. In addition, radius of curvature of the dual tip was sharpened by low-temperature thermal oxidation even though gap between the tips slightly widened about 290nm. Moreover, Si dual tip fabrication was demonstrated on a dual AFM cantilever with sputtered FePd film on Silicon on insulator (SOI) wafer.
収録刊行物
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- 電気学会論文誌E(センサ・マイクロマシン部門誌)
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電気学会論文誌E(センサ・マイクロマシン部門誌) 136 (7), 312-318, 2016
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679438486784
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- NII論文ID
- 130005160446
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL書誌ID
- 027541417
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可