Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups
-
- Kudo Hiroto
- Kansai University
-
- Ogawa Hiroki
- Kansai University
-
- Yamamoto Hiroki
- Osaka University
-
- Kozawa Takahiro
- Osaka University
書誌事項
- タイトル別名
-
- Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Group
この論文をさがす
抄録
We examined the condensation polymerization of t-butylcalix[8]arene (BCA[8]), p-t-butylcalix[4]arene (BCA[4]), and C-(4-t-butylbenz)calix[4]resorcinarene (BCRA[4]) with 1,3-adamantane dibromoacetate (ADB), yielding soluble polymers poly(BCA[8]-co-ADB), poly(BCA[4]-co-ADB), and poly(BCRA[4]-co-ADB), respectively. These polymers had good solubility, good film forming ability, and good thermal stability. It was anticipated that these polymers were applicable to positive-type resist materials. However, by the examination on the resist sensitivity using EUV exposure system, these polymers were applicable to negative type resist materials using THF as a developer. Furthermore, a negative clear resist pattern with 100nm resolution could be obtained by EB exposure system. These results indicated that poly(BCA[8]-co-ADB) and poly(BCRA[4]-co-ADB) have high potential to offer higher resolution negative pattern using EUV lithography system.
収録刊行物
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 29 (3), 495-500, 2016
フォトポリマー学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390282679301839488
-
- NII論文ID
- 130005256573
-
- NII書誌ID
- AA11576862
-
- ISSN
- 13496336
- 09149244
-
- HANDLE
- 10112/11221
-
- NDL書誌ID
- 027467462
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- IRDB
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可