Microstructure of Erbium Oxide Thin Film on SUS316 Substrate with Y₂O₃ or CeO₂ Buffer Layers Formed by MOCVD Method

• Lee Seungwon

  Graduate School of Science and Engineering for Research, University of Toyama

• Shinkawa Takayuki

  Graduate School of Science and Engineering for Education, University of Toyama

• Matsuda Kenji

  Graduate School of Science and Engineering for Research, University of Toyama

• Tanaka Masaki

  National Institute of Fusion Science

• Hishinuma Yoshimitsu

  National Institute of Fusion Science

• Nishimura Katsuhiko

  Graduate School of Science and Engineering for Research, University of Toyama

• Tanaka Teruya

  National Institute of Fusion Science

• Muroga Takeo

  National Institute of Fusion Science

• Sato Takahiro

  Hitachi High-Technologies Corp.

Bibliographic Information

Other Title

• Microstructure of Erbium Oxide Thin Film on SUS316 Substrate with Y₂O₃ or CeO₂ Buffer Layers Formed by MOCVD Method

Abstract

Er₂O₃ has been known the best candidate material for insulating coating for liquid metal breeding blanket system. The formation of Er₂O₃ layer by MOCVD method can be succeeded on SUS316 substrate with CeO₂ and Y₂O₃ buffer layers (100 nm and 500 nm) fabricated by RF sputtering, and their microstructures have been confirmed by SEM, TEM and STEM. The surface morphology of their layers was smaller granular structure than the previous study without buffer layer. According to cross sectional TEM (X-TEM) observation, Er₂O₃, CeO₂/Y₂O₃ buffer, unknown layers and SUS substrate can be confirmed. CeO₂ buffer layer has a granular structure, while Y₂O₃ has a columnar structure. Er₂O₃ layer formed on each buffer layer had finer structure without buffer layer. It has been also detected that each element does not exist so much in each layer by diffusion during fabrication according to STEM-EDS and HAADF imaging.

Journal

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 58 (2), 231-235, 2017

  The Japan Institute of Metals and Materials

Keywords

• erbium oxide
• buffer layers
• metal organic chemical vapor deposition (MOCVD)
• microstructure
• transmission electron microscopy

Details

• CRID: 1390001204253257472
• NII Article ID: 120006411235
• NII Article ID: 130005297191
• NII Book ID: AA1151294X
• DOI: 10.2320/matertrans.m2016313
• ISSN: 13475320
• ISSN: 13459678
• HANDLE: 10110/00018301
• NDL BIB ID: 027871988
• Web Site: https://toyama.repo.nii.ac.jp/records/15837
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I027871988
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/58/2/58_M2016313/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • IRDB
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed