Large-scale vortical structure detection using microphone array in a semiconductor single wafer spin cleaner

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  • マイクロフォンアレイを用いた枚葉式半導体洗浄装置内に形成される大規模渦構造の検出

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Abstract

<p>Fluctuating pressure (p’ ) of a large-scale vortical structure generated in a semiconductor single wafer spin cleaner was detected by using microphone array. Twelve microphones were installed on the exhaust cover under the rotating disk of the cleaner with their interval of 7.5° or 15°. Power spectrum densities (PSD) of p’ were compared with those of fluctuating velocity measured by PIV for various rotation angular velocities to identify fluctuations due to convection of the large-scale vortical structure. Good agreement of PSDs indicates that the large-scale structure could be detected by using microphone. Cross-correlation of p’ measured at different positions revealed that the large-scale structure convected to the downstream in the rotational direction of the disk. The convection speed was about 12 % of the angular velocity of the rotating disk. Number of the vortex in the large-scale structure was also evaluated from the time-series p’ data. Time-space contour map was made for p’ based on the data measured at the different angular position, and showed periodical swept strip patterns. Presences of the strip patterns indicate the pressure disturbances were stably convected to the downstream. From this time-space map, two-dimensional Fourier transform efficiently extracted the number of vortices in the large-scale structure.</p>

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