高密度プラズマアシスト蒸着により作製したSiO₂およびNb₂O₅光学薄膜の機械的特性に与える基板温度の影響

• 森泉 康

  日東光学㈱ オプト製造本部 レンズ製造部 関東学院大学 大学院工学研究科 工業化学専攻

• 本間 英夫

  関東学院大学 材料・表面工学研究所

• 高井 治

  関東学院大学 大学院工学研究科 工業化学専攻 関東学院大学 材料・表面工学研究所

書誌事項

タイトル別名

• Influence of Substrate Temperature on Mechanical Properties of SiO₂ and Nb₂O₅ Optical Thin Films Prepared by High-Density Plasma Assisted Vapor Deposition
• 高密度プラズマアシスト蒸着により作製したSio₂およびNb₂O₅光学薄膜の機械的特性に与える基板温度の影響
• コウミツド プラズマアシスト ジョウチャク ニ ヨリ サクセイ シタ Sio ₂ オヨビ Nb ₂ O ₅ コウガク ハクマク ノ キカイテキ トクセイ ニ アタエル キバン オンド ノ エイキョウ

抄録

To improve optical lens transmission characteristics, anti-reflection film is applied to a lens surface. The substrate temperature strongly affects optical thin film durability and determines the thin film structure. Therefore, substrate temperature fluctuation from 25 ℃ to 400 ℃ during deposition was verified to improve mechanical properties while maintaining optical properties. As anti-reflection films, SiO₂ and Nb₂O₅ were used. Each single-layer thin film was prepared using high-density plasma assisted vapor deposition at different substrate temperatures. Then, each single-layer film was evaluated using a falling sand test. The amount of transmittance change during testing after production at high temperatures was small for each film. Behaviors of refractive index and film stress demonstrated that these films were dense and stable after production at high temperatures. Furthermore, their surface roughness revealed that SiO₂ films had small values and that Nb₂O₅ films had large values under high substrate temperatures. For these analyses, cross-sections of the tested films were observed using SEM（Scanning Electron Microscope）. Both thin films' hardness was measured by nanoindentation. These tests revealed high brittleness of the SiO₂ thin film. Actually, Nb₂O₅ thin film tends to be plastically deformed: different heights of damage during extrusion affect the surface roughness. XPS（X-ray Photoelectron Spectroscopy）results showed differences in films from the bonding state according to the substrate temperature. Various measurement results obtained at various temperatures and fluctuation patterns revealed that the most durable films of each thin film type are produced at high temperatures.

収録刊行物

• 表面技術

  表面技術 67 (2), 97-104, 2016

  一般社団法人 表面技術協会

キーワード

• SiO₂
• Nb₂O₅
• Optical Thin Film
• Substrate Temperature
• Plastic Deformation

詳細情報

• CRID: 1390001204116846592
• NII論文ID: 130005306143
• NII書誌ID: AN1005202X
• DOI: 10.4139/sfj.67.97
• ISSN: 18843409
• ISSN: 09151869
• NDL書誌ID: 027097180
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I027097180
• Web Site: https://www.jstage.jst.go.jp/article/sfj/67/2/67_97/_pdf
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可