Effect of Background Pressure on the Performance of Organic Field Effect Transistors with Copper Electrodes
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- TRAN Cuong Manh
- School of Material Science, Japan Advanced Institute of Science and Technology
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- MURAKAMI Tatsuya
- School of Material Science, Japan Advanced Institute of Science and Technology
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- SAKAI Heisuke
- School of Material Science, Japan Advanced Institute of Science and Technology
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- MURATA Hideyuki
- School of Material Science, Japan Advanced Institute of Science and Technology
Abstract
<p>We demonstrate the effect of vacuum pressure on the mobility (µ) and the threshold voltage (Vth) of organic field effect transistor (OFETs) using copper as source-drain electrodes. OFETs with copper electrodes deposited at high background pressure are better in electric characteristics compared with traditional devices fabricated under low pressure using gold electrodes.</p>
Journal
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- IEICE Transactions on Electronics
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IEICE Transactions on Electronics E100.C (2), 122-125, 2017
The Institute of Electronics, Information and Communication Engineers
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Keywords
Details 詳細情報について
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- CRID
- 1390001204378827520
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- NII Article ID
- 130005306502
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- ISSN
- 17451353
- 09168524
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- Text Lang
- en
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed