化粧品における防腐処方設計の考え方 —パラベンフリー・防腐剤フリーの実現に向けて—  [in Japanese] The Viewpoint of Formulation Design for Preservative-free and Paraben-free Cosmetics  [in Japanese]

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Author(s)

Abstract

近年でも微生物汚染が原因により製品回収に至った化粧品の事例がある。消費者が化粧品を使用する際に,使い始めから終わりまで安全に安心して使用できることは化粧品が有すべき重要な品質である。本稿では二次汚染リスクの高い製品に対する製品設計上の留意点や,使用頻度が高い防腐剤,国際的な防腐剤規制状況,防腐力に影響を与える因子などを中心に概要を列挙した。また,消費者の安全性志向の高まりや海外の防腐剤の配合規制に応えるため,われわれはパラベンフリー・防腐剤フリーを目的とした製品開発に向けて,1,2-アルカンジオールの抗菌効果と皮膚の感覚刺激性についてパラベンと比較して調べた。その結果,抗菌効果はほぼ同等であり,感覚刺激性はパラベンに比べて有意に低いことを確認した。化粧品開発において適正な製品品質を確保した防腐処方設計の考え方の一助となれば幸いである。

Over the last few years, there have been incidents where cosmetics were recalled due to microbial contamination. An important feature of cosmetics is that when consumers use them they feel safe and confident in doing so from start to finish. This paper has summarized precautions when designing products with a high risk of secondary contamination to preserve them. In addition, frequently used preservatives, the status of international regulations on preservatives, and factors that affect preservative efficacy (antimicrobial effectiveness) are mentioned. In response to increased safety consciousness among consumers and foreign regulations of preservatives, products need to be formulated and designed without parabens or other preservatives. We have examined the antimicrobial effectiveness and sensory irritation of the skin by 1,2-alkanediols in comparison to parabens. Results revealed that 1,2-alkanediols and parabens have almost the same level of antimicrobial effectiveness and that 1,2-alkanediols cause significantly less sensory irritation than parabens do. The hope is that these findings can help researchers to devise ways to preserve cosmetics while ensuring appropriate product quality during cosmetics development.

Journal

  • Journal of Society of Cosmetic Chemists of Japan

    Journal of Society of Cosmetic Chemists of Japan 51(1), 2-11, 2017

    The Society of Cosmetic Chemists of Japan

Codes

  • NII Article ID (NAID)
    130005465083
  • NII NACSIS-CAT ID (NCID)
    AN00101606
  • Text Lang
    JPN
  • ISSN
    0387-5253
  • NDL Article ID
    028082796
  • NDL Call No.
    Z17-820
  • Data Source
    NDL  J-STAGE 
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