Theoretical analysis of the atomic process on the growth surface: <i>ab initio</i> study

DOI

Bibliographic Information

Other Title
  • 結晶成長における表面過程の第一原理計算による考察

Abstract

First-principle calculations of growth surfaces were performed to understand the atomic process during the crystal growth. Here, as examples of the applications of this kind of calculations, the following two systems were analyzed: incorporation process of nitrogen (N) into GaAsN and diamond. In these systems, the stable surface structure under a certain growth conditions was determined, and substation energies of N into various sites on the stable surfaces were calculated. By combining with analysis of the stability of the defects in bulk crystal, incorporation/aggregation process of N could be indicated.

Journal

Details 詳細情報について

  • CRID
    1390001205544828160
  • NII Article ID
    130005468478
  • DOI
    10.14824/jakoka.2012.0_98
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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