Effect of working gas on c-BN film growth using rf magnetron sputtering

• Yamaguchi Naoaki

  University of Hyogo Graduate School of Engineering

• Niibe Masahito

  University of Hyogo

• Fujii Kiyotoshi

  Development Department

• Yoshiki Keisuke

  University of Hyogo Graduate School of Engineering

• Namazu Takahiro

  University of Hyogo Graduate School of Engineering

• Inoue Shozo

  University of Hyogo Graduate School of Engineering

Bibliographic Information

Other Title

• 高周波スパッタ法によるc-BN薄膜成長に及ぼすスパッタガス種の影響

Abstract

We have been trying to grow c-BN films using rf magnetron sputtering of a pyrolytic BN target. Systematical investigations showed that the working gas strongly affected the sputtering conditions for growing films containing c-BN phase. In this paper, we are going to discuss the effect of working gas on the c-BN film growth.

Journal

• Proceedings of JSPE Semestrial Meeting

  Proceedings of JSPE Semestrial Meeting 2015A (0), 509-510, 2015

  The Japan Society for Precision Engineering

Keywords

• sputtering
• nitride

Details

• CRID: 1390282680633742464
• NII Article ID: 130005486865
• DOI: 10.11522/pscjspe.2015a.0_509
• Text Lang: ja
• Data Source:
  • JaLC
  • CiNii Articles
• Abstract License Flag: Disallowed