Design of Advanced Functional ZnO Conductive Thin Films with Arc Plasma

• YAMAMOTO Tetsuya

  Research Institute, Kochi University of Technology

• NOMOTO Junichi

  Research Institute, Kochi University of Technology

• KITAMI Hisashi

  Research Institute, Kochi University of Technology Technology Research Center, Sumitomo Heavy Industries Ltd.

• SAKEMI Toshiyuki

  Technology Research Center, Sumitomo Heavy Industries Ltd.

• MAKINO Hisao

  Research Institute, Kochi University of Technology

• KOBAYASHI Keisuke

  Research Institute, Kochi University of Technology

• AOKI Yasushi

  Technology Research Center, Sumitomo Heavy Industries Ltd.

• KISHIMOTO Seiichi

  Department of Mechanical Engineering, Kochi National College of Technology

Bibliographic Information

Other Title

• アークプラズマによる酸化亜鉛導電膜機能設計
• アークプラズマ ニ ヨル サンカ アエン ドウデンマク キノウ セッケイ

Abstract

　We demonstrate the characteristics of dc arc plasma to clarify the advantage of reactive plasma deposition with dc arc plasma over the conventional other deposition methods such as magnetron sputtering. Both carrier concentration and crystallographic orientation distribution of Ga-doped ZnO (GZO) polycrystalline films deposited by the reactive plasma deposition can be controllable. The irradiation of electronegative oxygen ions (O⁻) generated in the afterarc plasma is an effective way for reducing the density of oxygen vacancies (V_O) together with an increase in the density of O⁻ trapped at the grain boundaries. V_O on and in the vicinity of the surface of ingrains exhibits as just hydrogen-gas adsorption sites, whereas O⁻ reacts with hydrogen gas to create carrier electrons. The hydrogen-gas sensors based on 50-nm-thick GZO films having the reactive O⁻ located at the grain boundaries exhibited high response to 0.25% of hydrogen gas at 330℃.<br>

Journal

• Journal of the Vacuum Society of Japan

  Journal of the Vacuum Society of Japan 60 (8), 292-299, 2017

  The Vacuum Society of Japan

Keywords

• Spectroscopy
• Surfaces and Interfaces
• Instrumentation
• General Materials Science

Details

• CRID: 1390282680271495936
• NII Article ID: 130005995440
• NII Book ID: AA12298652
• DOI: 10.3131/jvsj2.60.292
• ISSN: 18824749
• ISSN: 18822398
• NDL BIB ID: 028468040
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I028468040
• Web Site: https://www.jstage.jst.go.jp/article/jvsj2/60/8/60_17-RV-017/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed