Fabrication of Photocrosslinked Polysilane/diarylfluorene Blended Films with Tunable Refractive Indices
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- Okamura Haruyuki
- Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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- Iseki Masashi
- Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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- Degawa Kaai
- Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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- Matsumoto Akikazu
- Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
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- Minokami Keiko
- Fine Materials Business Division, Osaka Gas Chemicals Co., Ltd.
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- Miyauchi Shinsuke
- Fine Materials Business Division, Osaka Gas Chemicals Co., Ltd.
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We have developed the photocrosslinked films of a diphenyl- or dinaphthylfluorene having epoxy and oxetane moieties and polysilanes blends in the presence of a photoacid generator by irradiation at 405 nm. Photo-induced decomposition of the Si-Si bonds of the polysilanes was successfully suppressed during the visible light irradiation. The cationic photocrosslinking properties of the blends were strongly affected by the post-exposure-bake conditions and irradiation dose. Polysilane moieties were incorporated into the film by the termination reaction of the polymerization with the terminal OH groups. We have successfully fabricated films with high refractive indices (nd: 1.70) and the refractive index values were tunable by irradiation at 254 nm due to the decomposition of the Si-Si bonds of the polysilanes.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 30 (6), 683-688, 2017
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詳細情報 詳細情報について
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- CRID
- 1390001204324435456
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- NII論文ID
- 130006309122
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 028726715
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可