プラズマ CVD により DLC 全面成膜したシリコン薄膜の引張強度とばらつきの解析

• 張 文磊

  京都大学

• 平井 義和

  京都大学

• 土屋 智由

  京都大学

• 田畑 修

  京都大学

書誌事項

タイトル別名

• Tensile Strength and Deviation Analysis of Micro-scaled Silicon Structure with Full-coated PECVD DLC Film

抄録

The influence of deposition bias voltage on the tensile properties of single-crystal silicon microstructure fully coated with 150 nm-thick diamond like carbon film using plasma enhanced chemical vapor deposition were investigated. The fabricated structure had dimensions of 120 μm long, 4 μm wide and 5 μm thick. PECVD DLC film has the average sp² phase of 44%, sp³ phase of 20% and hydrogen content of 36% from photoelectron spectroscopy (XPS), and thermal desorption spectrometry (TDS) analysis. With increasing negative bias voltage, sp³ phase increased and sp² phase, hydrogen content decreased. The tensile strength of DLC coated SCS samples was 13.2%-29.6% higher compared to the bare silicon samples. The -400 V bias showed the highest strength of 3.94 GPa, which was in a good agreement with the measurement result of DLC fracture toughness. The deviation in strength reduced significantly with increasing negative bias voltage.

収録刊行物

• マイクロ・ナノ工学シンポジウム

  マイクロ・ナノ工学シンポジウム 2017.8 (0), PN-129-, 2017

  一般社団法人 日本機械学会

キーワード

• Diamond like carbon film
• Single crystal silicon
• Substrate bias voltage
• Chemical contents
• Tensile properties

詳細情報

• CRID: 1390001288034900096
• NII論文ID: 130006744916
• DOI: 10.1299/jsmemnm.2017.8.pn-129
• ISSN: 24329495
• Web Site: https://www.jstage.jst.go.jp/article/jsmemnm/2017.8/0/2017.8_PN-129/_pdf
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可