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- TAKAHASHI Nobuo
- Graduate School of Economics, University of Tokyo
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- KIKUCHI Hiroki
- Graduate School of Economics, University of Tokyo
書誌事項
- タイトル別名
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- The Paradigm of Photolithography Equipment
抄録
<p>Photolithography equipment used in the manufacture of semiconductors has been predicted to hit a technological limit based on the Rayleigh criterion in terms of resolution. In actuality, however, the predicted limits of resolution are exceeded and increased microfabrication of photolithography equipment is achieved because of a change in the architecture from {mirror system, equal magnification, batch exposure} to {lens system, reduction, divided exposure}. Instead of using the Rayleigh criterion to make such predictions, experts use it to repeatedly generate “a set of recurrent and quasi-standard illustrations” as methods to improve resolution. The Rayleigh criterion itself is a typical example of what Kuhn (1962) termed a “community paradigm,” by which improvements to resolution were achieved by (a) increasing numerical aperture, (b) shortening wavelength, and (c) reducing the k1 factor.</p>
収録刊行物
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- Annals of Business Administrative Science
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Annals of Business Administrative Science 16 (5), 203-213, 2017-10-15
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詳細情報 詳細情報について
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- CRID
- 1390001205420487552
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- NII論文ID
- 130006907749
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- ISSN
- 13474456
- 13474464
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可