Printing of Lenticular Lens Patterns Using Defocused Projection Lithography

• Kobayashi Hiroshi

  Tokyo Denki University

• Morizane Yuta

  Tokyo Denki University

• Horiuchi Toshiyuki

  Tokyo Denki University

抄録

A new optical lithography method for fabricating humpbacked pattern arrays was developed. The patterns were printed by adopting intentionally defocused projection exposure under the condition of very low numerical aperture of 0.089. As a resist, approximately 100-μm thick SU-8 (MicroChem) was used, and appropriate defocuses were 1400-2000 μm. When the exposure time and the defocus were changed, curvature radii of lens patterns were controllable in a wide range of 70-300 μm. The curvature radius became large when the exposure time was extended, and the defocus was reduced. The patterns will be usable as original molds of lenticular lens arrays. In addition, the patterns will also be usable as temporal lenticular lens arrays as they are, because the SU-8 is almost transparent for visible light.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 31 (1), 45-50, 2018-06-25

  フォトポリマー学会

キーワード

• Humpbacked pattern
• Lenticular lens
• Projection exposure
• Defocus

詳細情報

• CRID: 1390282763045868160
• NII論文ID: 130007481447
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.31.45
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 029061777
• Web Site: http://id.ndl.go.jp/bib/029061777
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I029061777
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/31/1/31_45/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• 抄録ライセンスフラグ: 使用不可