Novel Photoresist using Photodeprotectable N-Alkoxybenzyl Aromatic Polyamide

• Iwashita Kenichi

  Photosensitive Material R&D Department, Hitachi Chemical Co. Ltd. Department of Materials and Life Chemistry, Kanagawa University

• Suzuki Ryousuke

  Department of Materials and Life Chemistry, Kanagawa University

• Katoh Hironobu

  Department of Materials and Life Chemistry, Kanagawa University

• Ohta Yoshihiro

  Department of Materials and Life Chemistry, Kanagawa University

• Yokozawa Tsutomu

  Department of Materials and Life Chemistry, Kanagawa University

書誌事項

タイトル別名

• Novel Photoresist using Photodeprotectable <i>N</i>-Alkoxybenzyl Aromatic Polyamide

抄録

Photodeprotection of N-octyloxybenzyl aromatic polyamide film containing photo acid generator (PAG) was investigated. The photodeprotection was proceeded well under UV irradiation (5 J/cm²), followed by heating at 130 °C for 15 min in the presence of 25 wt% of PAG. Line pattern of 30 to 20 μm on Si wafer was obtained from the photosensitive film after dipping into acetone. It turned out that N-alkoxybenzyl aromatic polyamides serve as a new photosensitive material in the presence of PAG.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 31 (4), 467-472, 2018-06-25

  フォトポリマー学会

キーワード

• N-protected polyamide
• Photodeprotection
• Photo acid generator
• Photosensitive

詳細情報

• CRID: 1390564238022577024
• NII論文ID: 130007481476
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.31.467
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 029061799
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I029061799
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/31/4/31_467/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
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