Au "Edged Hole Array" for Sensor Application

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  • Yamada Hirotaka
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Kawasaki Daiki
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Inoue Chigusa
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Maeno Kenichi
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Sueyoshi Kenji
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Hisamoto Hideaki
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Endo Tatsuro
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University PRESTO, JST, Japan Science Technology Agency

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Abstract

<p>This paper described the design and fabrication of precursor for Au hole structure with four edges (edged hole array: EHA) for sensor application. In this paper, effect of the gap length of opposite edges g and hole side length l was investigated systematically by simulation. As the result, optimal design of EHA that shows strong light absorption (> 90%) and electric field (1.79×105-fold increase against the incident light) at λ = 785 nm was revealed. Finally, the precursor resist pattern for EHA was fabricated using electron beam lithography and cold development. As the result, the precursor structure that was expected to generate strong electric field at λ = 785 nm was successfully fabricated.</p>

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