Organic Small Molecule Covalently Functionalized Molybdenum Disulfide Hybrid Material for Optical Limiting

DOI PDF 参考文献29件
  • Fan Gan
    Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, P. R. China
  • Ningning Dong
    Laboratory of Micro-Nano Optoelectronic Materials and Devices, Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai 201800, P. R. China
  • Zhiwei Liu
    Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, P. R. China
  • Huimei Jia
    Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, P. R. China
  • Jun Wang
    Laboratory of Micro-Nano Optoelectronic Materials and Devices, Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai 201800, P. R. China
  • Yu Chen
    Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, P. R. China

抄録

<jats:title>Abstract</jats:title> <jats:p>Molybdenum disulfide (MoS2) nanosheets are insoluble in any organic solvent, which makes them more difficult to fabricate into thin film devices for nanoelectronics and nonlinear optics. To solve practical solution-processability problems of the MoS2 nanosheets, it would be ideal and feasible to design and synthesize MoS2-based solution-processed organic/polymeric materials. In this work, new organic small molecule covalently modified MoS2 nanosheets (MoS2-CHT) were synthesized through a simple reaction between MoS2 and 6-(9H-carbazol-9-yl)hexane-1-thiol (CHT). Both a DMF solution of MoS2-CHT and a MoS2-CHT/PMMA film exhibited excellent nonlinear optical (NLO) and optical limiting (OL) responses when compared to the MoS2 and MoS2/CHT mixture. As a result, among these materials, the annealed MoS2-CHT/PMMA film showed the largest nonlinear absorption coefficients (βeff) and highest imaginary third-order susceptibilities (Imχ(3)) (997.75 cm/GW and 4.25 × 10−10 esu at 532 nm; 372.62 cm/GW and 3.19 × 10−10 esu at 1064 nm). The enhanced NLO/OL performance of the annealed film could be due to the structural transition of MoS2 in MoS2-CHT from the 1T phase to the 2H phase during the annealing and the possible thermal-induced electron transfer effect between MoS2 and CHT moieties in MoS2-CHT.</jats:p>

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