Investigation of a New Method of the Organosilicon Compounds Activation by a Low-energy Electron Beam for SiCN-coatings Deposition

• Menshakov Andrey

  Institute of Electrophysics of the Ural Branch of the Russian Academy of Sciences Ural Federal University

• Cholakh Seif

  Ural Federal University

抄録

The article describes a new method of organosilicon compounds activation by low energy electron beam for SiCN coatings deposition. The composition of the beam plasma in a hexamethyldisilazane-containing gas medium was studied, and it was shown that the precursor molecules decomposition degree increases with the beam current and nonmonotonically depends on the electron beam energy. The application of a low-energy electron beam for the plasma-chemical vapor decomposition of hexamethyldisilazane and for samples heating up by electron beam to 600°C makes it possible to obtain SiCN-based coatings with a hardness up to 18 GPa and thickness ∼1 μm for 1 h.

収録刊行物

• e-Journal of Surface Science and Nanotechnology

  e-Journal of Surface Science and Nanotechnology 18 (0), 38-40, 2020-02-29

  公益社団法人 日本表面真空学会

キーワード

• <i>SiCN coating</i>
• <i>Polymer derived ceramic</i>
• <i>Low-energy electron beam</i>

詳細情報

• CRID: 1390565134832009088
• NII論文ID: 130007803776
• DOI: 10.1380/ejssnt.2020.38
• ISSN: 13480391
• Web Site: https://www.jstage.jst.go.jp/article/ejssnt/18/0/18_38/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可