Effect of the Concentration Gradient on Molecular Alignment by Scanning Wave Photopolymerization
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- Kobayashi Yoshiaki
- Laboratory for Chemistry and Life Science, Institute of Innovative Research, Tokyo Institute of Technology Department of Chemical Science and Engineering, School of Materials and Chemical Technology
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- Taguchi Ryo
- Laboratory for Chemistry and Life Science, Institute of Innovative Research, Tokyo Institute of Technology Department of Chemical Science and Engineering, School of Materials and Chemical Technology
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- Akamatsu Norihisa
- Laboratory for Chemistry and Life Science, Institute of Innovative Research, Tokyo Institute of Technology Department of Chemical Science and Engineering, School of Materials and Chemical Technology
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- Shishido Atsushi
- Laboratory for Chemistry and Life Science, Institute of Innovative Research, Tokyo Institute of Technology Department of Chemical Science and Engineering, School of Materials and Chemical Technology
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Abstract
<p>Macroscopic and precise alignment control of functional molecules can provide increased functionality and enhanced device performance. However, even the most powerful current method has some limitations, such as the need for polarized light and photoresponsive dye molecules. We reported an alignment process based on a new concept of scanning wave photopolymerization (SWaP) that achieves an arbitrary alignment pattern by spatiotemporal light-triggered molecular diffusion. Here, we investigate the effect of crosslinker on molecular alignment by SWaP. We found that the controlled concentration gradient of polymer added with the optimal amount of crosslinker improved the degree of alignment of the liquid-crystalline polymers. SWaP could be employed as a simple and versatile fabrication process for preparing highly functional materials and devices that require alignment control.</p>
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 33 (3), 291-294, 2020-07-01
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390285300171357824
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- NII Article ID
- 130007867564
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- NII Book ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 030413254
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed