局在光によるナノ研磨現象観測に関する研究

DOI

書誌事項

タイトル別名
  • Study on Nanoscale Observatory in Polishing Phenomena applying Optical Evanescent Field
  • 1st Report : Experimental Evaluation by Developed Compact Apparatus
  • 第１報：開発した小型装置による実験的評価

抄録

<p>The nanoscale polishing phenomena between the substrate surface and polishing pad during process, such as CMP process, were observed and evaluated, in this report. The concept of observation method is applied the generated evanescent field to limit the observable region only on the surface being polished, and the detectable scattering light from the nanoparticles and polishing pad when they move close to the surface in a range of evanescent field. The detected scattering light intensity could be used for evaluating the phenomena. According to the observed results, there should have been more than two different phenomena in polishing; the particles adhering on the polishing pad, and the individual movement particles during moving. However, the phenomena being able to perform polishing, could not clearly identify yet.</p>

収録刊行物

キーワード

詳細情報 詳細情報について

  • CRID
    1390567172578574720
  • NII論文ID
    130007896847
  • DOI
    10.11522/pscjspe.2020s.0_658
  • 本文言語コード
    en
  • データソース種別
    • JaLC
    • CiNii Articles
  • 抄録ライセンスフラグ
    使用不可

問題の指摘

ページトップへ