軟X線による物質アブレーション

• 牧村 哲也

  筑波大学 数理物質科学研究科

• 錦野 将元

  日本原子力研究開発機構 量子ビーム応用研究部門

• 河内 哲哉

  日本原子力研究開発機構 量子ビーム応用研究部門

書誌事項

タイトル別名

• Ablation Using Soft X-ray Sources
• ナンXセン ニ ヨル ブッシツ アブレーション

抄録

X-ray ablation has been recently achieved using plasma soft X-ray lasers, laser plasma soft X-rays, and X-ray free electron lasers. Nanosecond laser plasma soft X-rays sources allow us to fabricate highquality micro- and nano-structures of poly (methylmethacrylate) (PMMA), poly (dimethylsiloxane) (PDMS), and SiO₂. Even after the soft X-ray irradiation, the surfaces of these materials have the same chemical structures as those of unirradiated surfaces. We found that ablation of SiO₂ occurs more efficiently than linear optical absorption and energy accumulation to break all of the bonds in SiO₂ surfaces. Picosecond plasma soft X-ray laser sources allow us to ablate LiF crystals at a low threshold fluence. The ablation is explained in terms of spallative ablation, that is, removal of a surface layer by tensile stress induced by the short-pulse X-ray irradiation, without breaking the layer into atomic species. It should be noted that nanostructures such as nano-cones on Al surfaces can be fabricated by irradiation with the plasma soft X-ray laser light

収録刊行物

• レーザー研究

  レーザー研究 42 (1), 45-, 2014

  一般社団法人 レーザー学会

キーワード

• Plasma soft X-ray laser, Laser plasma soft X-ray, Ablation, Etching

詳細情報

• CRID: 1390285697590895488
• NII論文ID: 130007897464
• NII書誌ID: AN00255326
• DOI: 10.2184/lsj.42.1_45
• ISSN: 13496603
• ISSN: 03870200
• NDL書誌ID: 025162663
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025162663
• Web Site: https://www.jstage.jst.go.jp/article/lsj/42/1/42_45/_pdf
• 本文言語コード: ja
• データソース種別:
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