Suppression of Super High-Energy Species by VHF-DC Superimposed Magnetron Sputter Plasma

• Sakashita Yohei

• Takagi Yusuke

• Kato Takeshi

• Toyoda Hirotaka

• lwata Satoshi

• Tsunashima Shigeru

• Sugai Hideo

抄録

Magnetron discharge is maintained with very low target DC voltages (100-200 V) by applying 40 MHz VHF power to the target, without decreasing sputter deposition rate. From measurement of Ar+ energy distribution function (EDF) and simulation of Ar+ and Ar EDFs, it is confirmed that the VHF-DC magnetron discharge suppresses the maximum kinetic energy of backscattered Ar atom. This magnetron sputter source is applied to the deposition of magnetic multilayer film for perpendicular magnetic recording. From measurements of atomic force microprobe, the VHF-DC magnetron sputtering shows drastically-improved film flatness, compared with conventional DC magnetron sputtering.

収録刊行物

• Transactions of the Materials Research Society of Japan

  Transactions of the Materials Research Society of Japan 32 (2), 481-484, 2007

  一般社団法人 日本MRS

キーワード

• backscattering
• magnetron sputtering
• multilayer film

詳細情報

• CRID: 1390004222631657600
• NII論文ID: 130007922833
• DOI: 10.14723/tmrsj.32.481
• ISSN: 21881650
• ISSN: 13823469
• Web Site: https://www.jstage.jst.go.jp/article/tmrsj/32/2/32_481/_pdf
• 本文言語コード: en
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• 抄録ライセンスフラグ: 使用不可