Deposition of Noble Metal Catalysts on SiC Wafer by Electroless Process

• FUKUDA Kenji

  Graduate School of Engineering, University of Hyogo

• FUJII Ryo

  Graduate School of Engineering, University of Hyogo

• TAKASAKA Yuichi

  Graduate School of Engineering, University of Hyogo

• YAMADA Naoki

  Graduate School of Engineering, University of Hyogo

• MATSUMOTO Ayumu

  Graduate School of Engineering, University of Hyogo

• YAE Shinji

  Graduate School of Engineering, University of Hyogo

Bibliographic Information

Other Title

• 無電解プロセスによるSiC基板上への貴金属触媒の析出
• ムデンカイ プロセス ニ ヨル SiC キバン ジョウ エ ノ キキンゾク ショクバイ ノ セキシュツ

Abstract

Catalyst modification on SiC substrates is a key technology for forming electrodes of power devices by electroless deposition. We deposited noble metals of five kinds on 4H-n-SiC substrates in a mixture solution of metal salt and HF under photoillumination. The metal particle nucleation and growth behavior differed considerably depending on the kind of metal.

Journal

• Journal of The Surface Finishing Society of Japan

  Journal of The Surface Finishing Society of Japan 71 (12), 839-841, 2020-12-01

  The Surface Finishing Society of Japan

Keywords

• 4H-n-SiC
• Electroless Deposition
• Photoelectrochemistry
• Noble Metal Particles

Details

• CRID: 1390849376466263936
• NII Article ID: 130007950434
• NII Book ID: AN1005202X
• DOI: 10.4139/sfj.71.839
• ISSN: 18843409
• ISSN: 09151869
• NDL BIB ID: 030806993
• Web Site: http://id.ndl.go.jp/bib/030806993
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I030806993
• Web Site: https://www.jstage.jst.go.jp/article/sfj/71/12/71_839/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed