Characterization of the VO_x Thin Films Grown on C-plane Sapphire Substrates by MOD

• Wada Hideo

  Osaka Institute of Technology

• Koike Kazuto

  Osaka Institute of Technology

• Yano Mitsuaki

  Osaka Institute of Technology

Bibliographic Information

Other Title

• MOD法によるC面サファイア基板上VO_x薄膜成長と評価
• MOD法によるC面サファイア基板上VO[x]薄膜成長と評価
• MODホウ ニ ヨル Cメン サファイア キバン ジョウ VO[x]ハクマク セイチョウ ト ヒョウカ

Abstract

Vanadium oxide (VO_x) thin films were grown on c-plane sapphire substrates by metal-organic decomposition (MOD). Their crystallinity and optical characteristics were evaluated by XRD, XPS, AFM, LSM and a spectrophotometer. The crystallinity of the VO_x thin films were improved in adjusting the O reduction by controlling the firing time in N₂ atmosphere and a spin coating rotation speed. As a result, in the optimized VO_x samples under a firing temperature of 580°C after calcining at 300°C with 6000 rpm coating speed, the growth of polycrystalline fine nanoparticles of a single composition was confirmed which has good thermochromic characteristics.

Journal

• IEEJ Transactions on Fundamentals and Materials

  IEEJ Transactions on Fundamentals and Materials 141 (5), 345-350, 2021-05-01

  The Institute of Electrical Engineers of Japan

Keywords

• metal-organic decomposition (MOD)
• vanadium oxide (VO_x)
• smart window
• orientation factor
• dimming rate

Details

• CRID: 1390850857223670400
• NII Article ID: 130008033158
• NII Book ID: AN10136312
• DOI: 10.1541/ieejfms.141.345
• ISSN: 13475533
• ISSN: 03854205
• NDL BIB ID: 031498953
• Web Site: http://id.ndl.go.jp/bib/031498953
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I031498953
• Web Site: https://www.jstage.jst.go.jp/article/ieejfms/141/5/141_345/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed