Chemical vapor deposition of highly oriented ceramic coatings in a high-intensity laser irradiation

  • ITO Akihiko
    Graduate School of Environment and Information Sciences, Yokohama National University

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<p>High-intensity laser irradiation promotes a chemical reaction between the vapor phase and the film surface in the chemical vapor deposition (CVD) process, resulting in a high-speed deposition and a significant oriented growth of various kinds of oxides, nitrides, carbides, and their compounds and composites. TEM observation revealed unique microstructures, such as columnar, feather-like, and single-crystalline growth, in the produced CVD coatings. This CVD process enables the combination of high-speed epitaxial growth and excellent properties for structural and functional ceramic coatings. Traditional ceramics, such as Al2O3, TiO2, Al2TiO5, BaAl12O19, BaTiO3, YBa2Cu3O7−δ, and CeO2, can be still highly valued as practical materials by functionalization of ceramic coatings with the control of orientation and nanostructure.</p>

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