Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H₂/O₂ Mixtures Activated on a Tungsten Hot-wire Catalyst

• Koki Akita

• Shota Sogo

• Ryusei Sogame

• Masashi Yamamoto

• Shiro Nagaoka

• Hironobu Umemoto

• Hideo Horibe

Journal

• Journal of photopolymer science and technology

  Journal of photopolymer science and technology 34 (5), 499-504, 2021

  Chiba : The Society of Photopolymer Science and Technology

Keywords

• Crosslinking
• Hardening
• H₂/O₂ mixture
• Photo-active compound (PAC)
• Radical
• Removal

Details

• CRID: 1520854806242325248
• NII Article ID: 130008119601
• NII Book ID: AA11576862
• ISSN: 09149244
• ISSN: 13496336
• DOI: 10.2494/photopolymer.34.499
• NDL BIB ID: 031669711
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I031669711
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/34/5/34_499/_pdf
• Text Lang: en
• NDL Source Classification:
  • ZP48(科学技術--印写工学)
• Data Source:
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN