Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array

• Onodera Takeshi

  Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University

• Mieda Kengo

  Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University

• Taniguchi Kazuma

  Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University

Abstract

To fabricate a nanohole array chip, a mask in nanosphere lithography was fabricated by drag-coating convective self-assembly using two glass slides. The relationship between the volume fraction of 500-nm-diameter polystyrene (PS) particles and the deposition rate under our experimental conditions was determined. Masks with a monolayer of PS particles were deposited on glass slides. Plasma etching of the PS particles was carried out to reduce their diameter. Au was sputtered over the mask, and the mask was then removed. Finally, a nanohole array was obtained using this simple procedure.

Journal

• IEEJ Transactions on Sensors and Micromachines

  IEEJ Transactions on Sensors and Micromachines 142 (1), 15-16, 2022-01-01

  The Institute of Electrical Engineers of Japan

Keywords

• nanohole array
• convective self-assembly
• colloidal crystal
• nanosphere lithography

Details

• CRID: 1390853567321266816
• NII Article ID: 130008138868
• DOI: 10.1541/ieejsmas.142.15
• ISSN: 13475525
• ISSN: 13418939
• Web Site: https://www.jstage.jst.go.jp/article/ieejsmas/142/1/142_15/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed