Lower-temperature processing of potassium niobate films by microwave-assisted hydrothermal deposition technique

• OKURA Masaki

  Department of Materials and Life Sciences, Sophia University

• ITO Yoshiharu

  Department of Applied Molecular Chemistry, Nihon University

• SHIRAISHI Takahisa

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology

• KIGUCHI Takanori

  Institute for Material Research, Tohoku University

• KONNO Toyohiko J.

  Institute for Material Research, Tohoku University

• FUNAKUBO Hiroshi

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology

• UCHIDA Hiroshi

  Department of Materials and Life Sciences, Sophia University

抄録

Low-temperature processing based on microwave-assisted hydrothermal synthesis was proposed for deposition of piezoelectric oxoate KNbO₃ films. The films were deposited on various substrates at reaction temperature below 200 °C using Nb₂O₅ powder and KOH solution. Epitaxial (100)_c KNbO₃ film with ∼1.3 µm-thick was deposited at a reaction temperature of 150 °C on (100)_cSrRuO₃//(100)SrTiO₃ using 12 mol dm⁻³ KOH solution for 80 min, which is significantly faster than conventional hydrothermal process.

収録刊行物

• Journal of the Ceramic Society of Japan

  Journal of the Ceramic Society of Japan 130 (1), 123-130, 2022-01-01

  公益社団法人 日本セラミックス協会

キーワード

• Potassium niobate
• Hydrothermal synthesis
• Thin film
• Ferroelectrics
• Dielectrics
• Epitaxial growth
• Crystal orientation
• Crystal growth

詳細情報

• CRID: 1390009142391371648
• NII論文ID: 130008139215
• DOI: 10.2109/jcersj2.21115
• ISSN: 13486535
• ISSN: 18820743
• Web Site: https://www.jstage.jst.go.jp/article/jcersj2/130/1/130_21115/_pdf
• 本文言語コード: en
• データソース種別:
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  • Crossref
  • CiNii Articles
  • KAKEN
• 抄録ライセンスフラグ: 使用不可