Characteristics of Hydrogen Emission in Laser Plasma Induced by Focusing Fundamental Q-sw YAG Laser on Solid Samples

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Author(s)

    • Pardede Marincan
    • Department of Electronic Engineering, Faculty of Industrial Technique, University of Pelita Harapan, UPH Tower Lippo Karawaci, Tangerang, Indonesia
    • Suyanto Hery
    • Department of Physics, Faculty of Mathematics and Natural Sciences, Udayana University, Bukit Jimbaran, Bali, Indonesia
    • Hedwig Rinda
    • Hardware Laboratory, Bina Nusantara University, 9 K.H. Syahdan, Jakarta 11480, Indonesia
    • Kobayashi Takao
    • Department of Fiber Amenity, Faculty of Engineering, Fukui University, 9-1 Bunkyo 3-chome, Fukui 910-8507, Japan
    • Kagawa Kiichiro
    • Department of Physics, Faculty of Education and Regional Studies, Fukui University, Fukui 910-8507, Japan
    • Maruyama Tadashi
    • Japan Nuclear Cycle Development Institute, International Cooperation and Technology Development Center, 1, Shiraki, Tsuruga, Fukui 919-1279, Japan

Abstract

Hydrogen emission has been studied in laser plasma by focusing a Nd-YAG laser (1,064 nm, 50 mJ, 8 ns) on various types of samples, such as copper plate, zinc plate and glass plate. Several parameters influencing the emission were varied, such as the type of gas (air, nitrogen and helium), gas pressures (ranging from 2 up to 760 Torr) and laser power density. It was found that Hα emission with a narrow spectral width occurs with high efficiency when the laser plasma is produced in the low-pressure region. It was also confirmed that the conventional well-known laser-induced breakdown spectroscopy (LIBS), which usually carried out at atmospheric air pressure, cannot be applied for the analysis of hydrogen as impurity. This specific characteristic of the pressure dependence of hydrogen is interpreted based on our shock wave model, taking account of the fact that the hydrogen mass is extremely light compared to that of the host elements.

Journal

  • Jpn J Appl Phys

    Jpn J Appl Phys 43(7A), 4221-4228, 2004-07-15

    INSTITUTE OF PURE AND APPLIED PHYSICS

References:  22

  • <no title>

    LOREE T. R.

    Plasma Chem. Plasma Proc., 1981 1, 271, 1981

    Cited by (1)

  • <no title>

    RADZIEMSKI L. J.

    Laser-Induced Plasmas and Applications 1, 1989

    Cited by (1)

  • <no title>

    LIE T. J.

    Phys. J. Indonesian Phys. Soc. A 5, 0220-0221, 2003

    Cited by (1)

  • <no title>

    KAGAWA K.

    Spectrochim. Acta B 37, 789, 1982

    Cited by (5)

  • <no title>

    KAGAWA K.

    Trends Appl. Spectrosc. 2, 1, 1998

    Cited by (3)

  • <no title>

    KAGAWA K.

    Spectrochim. Acta B 39, 525, 1984

    Cited by (6)

  • <no title>

    KAGAWA K.

    Appl. Spectrosc. 48, 198, 1994

    Cited by (21)

  • <no title>

    KURNIAWAN H.

    J. Phys. D 28, 879, 1995

    Cited by (8)

  • <no title>

    KURNIAWAN H.

    Appl. Spectrosc. 55, 92, 2001

    Cited by (5)

  • <no title>

    MARPAUNG M.

    Jpn. J. Appl. Phys. 39, L601, 2000

    Cited by (7)

  • <no title>

    KURNIAWAN H.

    Spectrochim. Acta B 55, 839, 2000

    Cited by (5)

  • <no title>

    CHRISEY D. B.

    Pulsed Laser Depostition of Thin Films 115, 1994

    Cited by (1)

  • <no title>

    SILFVAST W. T.

    Appl. Phys. Lett. 25, 274, 1974

    Cited by (5)

  • <no title>

    KURNIAWAN H.

    Jpn. J. Appl. Phys. 31, 1213, 1992

    Cited by (6)

  • <no title>

    SEDOV L. I.

    Similarity and Dimensional Methods in Mechanics 213, 1959

    Cited by (7)

  • <no title>

    RADZIEMSKI L. J.

    Plasma Chem. & Plasma Process 1, 281, 1981

    DOI Cited by (7)

  • <no title>

    PETER L.

    Appl. Opt 42, 6199, 2003

    Cited by (1)

  • <no title>

    BUSTAMANTE M. F.

    Acta. B 57, 303, 2002

    Cited by (1)

  • <no title>

    PARIGGER C. G.

    Appl. Opt. 42, 6192, 2003

    Cited by (1)

  • <no title>

    LEIS F.

    Microchim. Acta. 2, 185, 1989

    Cited by (1)

  • <no title>

    SETIA BUDI W.

    Appl. Spectrosc. 53, 719, 1999

    DOI Cited by (5)

  • <no title>

    SUYANTO H.

    Jpn. J. Appl. Phys. 42, 5117, 2003

    DOI Cited by (5)

Cited by:  1

Codes

  • NII Article ID (NAID)
    150000043434
  • NII NACSIS-CAT ID (NCID)
    AA10457675
  • Text Lang
    EN
  • Article Type
    Journal Article
  • Journal Type
    大学紀要
  • ISSN
    0021-4922
  • NDL Article ID
    7012371
  • NDL Source Classification
    ZM35(科学技術--物理学)
  • NDL Call No.
    Z53-A375
  • Data Source
    CJP  CJPref  NDL  JSAP 
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