CuCl Microcrystallite-Doped SiO₂ Glass Thin Films Prepared by RF Sputtering

• Keiji Tsunetomo

• Ryuichiro Shimizu

• Akira Kawabuchi

• Hayuyuki Kitayama Hayuyuki Kitayama

• Yukio Osaka Yukio Osaka

抄録

CuCl microcrystallites were successfully doped into SiO 2 glass thin films by means of the magnetron rf-sputtering technique. A transmission electron microscopy (TEM) measurement showed that the microcrystallites had a spherical configuration. The average size of the microcrystallites was less than 5 nm and it was affected by the preparation condition and postdeposition annealing time. Optical absorption peaks corresponding to Z 3 and Z 1,2 exciton were observed. These absorption lines shifted to a higher-energy side with decreasing microcrystallite size. This phenomenon seems to relate to the quantum size effect.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 30 (4B), L764-, 1991-04-01

  IOP Publishing

キーワード

• General Physics and Astronomy
• General Engineering

詳細情報

• CRID: 1360284921817861888
• NII論文ID: 210000031693
• DOI: 10.1143/jjap.30.l764
• ISSN: 13474065
• ISSN: 00214922
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.30.L764
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.30.L764/pdf
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