Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography

• Takahiro Kozawa

• Seiichi Tagawa

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 46 (12L), L1200-, 2007-12-01

  IOP Publishing

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1360003446853519872
• NII Article ID: 210000063830
• DOI: 10.1143/jjap.46.l1200
• ISSN: 13474065
• ISSN: 00214922
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.L1200
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.46.L1200/pdf
• Data Source:
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  • CiNii Articles