Investigation of InAlAs Oxide/InP Metal–Oxide–Semiconductor Structures Formed by Wet Thermal Oxidation

• Shota Nakagawa

• Masafumi Yokoyama

• Osamu Ichikawa

• Masahiko Hata

• Masaaki Tanaka

• Mituru Takenaka

• Shinichi Takagi

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 48 (4S), 04C093-, 2009-04-01

  IOP Publishing

キーワード

• General Physics and Astronomy
• General Engineering

詳細情報

• CRID: 1360847871784786688
• NII論文ID: 210000066604
• DOI: 10.1143/jjap.48.04c093
• ISSN: 13474065
• ISSN: 00214922
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.48.04C093
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.48.04C093/pdf
• データソース種別:
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  • CiNii Articles