Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System

• Futoshi Iwata

• Kazutaka Saigo

• Toshihiko Asao

• Masatoshi Yasutake

• Osamu Takaoka

• Takuya Nakaue

• Shuichi Kikuchi

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 48 (8), 08JB20-, 2009-08-20

  IOP Publishing

Keywords

• General Physics and Astronomy
• Physics and Astronomy (miscellaneous)
• General Engineering

Details

• CRID: 1360847871785076864
• NII Article ID: 210000067326
• DOI: 10.1143/jjap.48.08jb20
• ISSN: 13474065
• ISSN: 00214922
• Data Source:
  • Crossref
  • CiNii Articles