Characterization of Microcrystalline Silicon Thin Film Transistors Fabricated by Thermal Plasma Jet Crystallization Technique

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Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 49(3), 03CA08-03CA08, 2010-03-23

    IOP Publishing

Codes

  • NII Article ID (NAID)
    210000068062
  • ISSN
    0021-4922
  • Data Source
    Crossref 
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