Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)

• Hiroyuki Seki

• Yuki Kato

• Hiroto Kudo

• Hiroaki Oizumi

• Toshiro Itani

• Tadatomi Nishikubo

Abstract

The synthesis and properties of noria derivatives containing oxetanyl groups were investigated for their application as negative-type extreme ultraviolet (EUV) resist materials. The solubility, film-forming ability, and photochemical reactivity were consistent with the structures of noria derivatives. The patterning properties of the synthesized noria derivatives were also examined using an EUV system, and patterns with 45 and 50 nm half-pitch resolution were obtained.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 49 (6S), 06GF06-, 2010-06-01

  IOP Publishing

Keywords

• General Physics and Astronomy
• General Engineering

Details

• CRID: 1360847871785630592
• NII Article ID: 210000068648
• DOI: 10.1143/jjap.49.06gf06
• ISSN: 13474065
• ISSN: 00214922
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.49.06GF06
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.49.06GF06/pdf
• Data Source:
  • Crossref
  • CiNii Articles